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Magazine Name : Solid State Technology:The International Magazine For Semiconductor Manufacturing

Year : 2001 Volume number : 44 Issue: 11

Optimized Bath Control For Void- Free Copper Depoition (Article)
Subject: Minimizing The Matrix Effect
Author: Z Sun      S. S Dixit     
page:      100 - 119
A New Generatiom Of Ic Processing : (Article)
Subject: Device Architecture Choises For Soi Cmos
Author: Jean-Luc Pelloie      Andre Auberton Herve     
page:      63 - 72
Using Wavelet Filtering For Monitoring Plasma Conditions (Article)
Subject: Acquistion Of Experimental Data
Author: Byoung-Jo Kim     
page:      73 - 82
Simultaneous Optimizatin Of Copper Electroplting And Cmp For Copper Processes (Article)
Subject: Cmp Development Process'
Author: Goutam Banerjee     
page:      83 - 90
Achieving Process Control Through Direct Measurment Of Plasma (Article)
Subject: Process Measurement
Author: J. O Scanlan      Chris Bowker     
page:      91 - 99